1031_INTRODUCTION TO SEMICONDUCTOR MICROFABRICATION TECHNOLOGY
Course Period：FromNow ~ Any Time
Course Intro
Course Plan
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102期中考題目及解答
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1031半導體學期總成績
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103半導體Final Exam
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103半導體midterm
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103半導體第一次小考解答
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103半導體第二次小考解答
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103半導體製程導論
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Chapter01_Introduction_v6
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Chapter02_Characteristics_of_Semiconductor_Materials_v7
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Chapter03_Device Technologies_v3
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Chapter04_Silicon and Wafer Preparation_v4
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Chapter09_IC Fabrication Process Overview_v2
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Chapter10_Oxidation
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Chapter11_Deposition
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Chapter13_Photolithography
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Chapter14_Photolithography Alignment and Exposure
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Chapter15_Photolithography Resist Development and Advanced Lithography
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Chapter16_Etch
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Chapter17_Doping
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半導體製程導論修課須知
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作業參考解答_Chap1
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作業參考解答_Chap10
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作業參考解答_Chap11
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作業參考解答_Chap13
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作業參考解答_Chap14
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作業參考解答_Chap15
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作業參考解答_Chap16
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作業參考解答_Chap17
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作業參考解答_Chap2
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作業參考解答_Chap3
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作業參考解答_Chap4
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作業參考解答_Chap9
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書商資料
Co-Instructor(s)
莊婉君
莊婉君
Co-Instructor(s)
陳威龍
陳威龍
Co-Instructor(s)
林冠賢
林冠賢
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