1041_INTRODUCTION TO SEMICONDUCTOR MICROFABRICATION TECHNOLOGY
Course Period：FromNow ~ Any Time
Course Intro
Course Plan
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Chapter01_Introduction_v6
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Chapter02_Characteristics of Semiconductor Materials_v9(新)
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Chapter02_Characteristics_of_Semiconductor_Materials_v7
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Chapter03_Device Technologies_v3
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Chapter04_Silicon and Wafer Preparation_v4
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Chapter04_Silicon and Wafer Preparation_v6(新)
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Chapter09_IC Fabrication Process Overview_v3(新)
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Chapter10_Oxidation_v4
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Chapter11_Deposition_v4
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Chapter13_Photolithography_v5
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Chapter14_Photolithography Alignment and Exposure_v5
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Chapter14_Photolithography Alignment and Exposure_v4
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Chapter15_Photolithography Resist Development and Advanced Lithography_v5
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Chapter16_Etch_v6
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Chapter17_ Doping_v7
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半導體midterm-20151116_v3
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半導體製程導論九章作業參考解答
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半導體製程導論小考1-V2
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半導體製程導論小考2-V1
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半導體製程導論小考3-V1
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半導體製程導論作業解答CH10
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半導體製程導論作業解答CH11
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半導體製程導論作業解答CH13
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半導體製程導論作業解答CH14
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半導體製程導論作業解答CH15
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半導體製程導論作業解答CH16
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半導體製程導論作業解答CH17
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半導體製程導論作業解答CH1~4
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半導體製程導論修課須知
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國立中山大學104學年度第1學期半導體製程導論課程大綱
Co-Instructor(s)
莊婉君
莊婉君
Co-Instructor(s)
陳威龍
陳威龍
Co-Instructor(s)
易志昇
易志昇
Co-Instructor(s)
黃炳源
黃炳源
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