1081_INTRODUCTION TO SEMICONDUCTOR MICROFABRICATION TECHNOLOGY
Course Period:FromNow ~ Any Time
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Course Intro

Course Plan

  • 108-1_半導體製程導論(期末總成績)_v17(上傳用)
  • 108-1_半導體製程導論(點名單)_v7(期中成績)要上傳
  • 108-1_半導體製程導論(點名單)_v9_20200103
  • 20191016半導體製程導論小考1-V1(加註解)
  • 20191016半導體製程導論小考1-V1
  • 20191225半導體製程導論小考2-V1
  • Chapter00_Introduction_v2
  • Chapter01_Introduction_v12
  • Chapter02_Characteristics of Semiconductor Materials_v21
  • Chapter04_Silicon and Wafer Preparation_v15
  • Chapter09_IC Fabrication Process Overview_v11
  • Chapter10_Oxidation_v12
  • Chapter11_Deposition_v11
  • Chapter13_Photolithography_v10
  • Chapter13_Photolithography_v9(已加作業題號)
  • Chapter14_Photolithography Alignment and Exposure_v10
  • Chapter15_Photolithography Resist Development and Advanced Lithography_v9(加作業題目)
  • Chapter16_Etch_v13
  • Chapter17_ Doping_v12
  • introduction-0
  • 半導體midterm-20191113_v2
  • 半導體製程導論作業解答CH1-4
  • 半導體製程導論作業解答CH10
  • 半導體製程導論作業解答CH11
  • 半導體製程導論作業解答CH13
  • 半導體製程導論作業解答CH14
  • 半導體製程導論作業解答CH15
  • 半導體製程導論作業解答CH16
  • 半導體製程導論作業解答CH17
  • 半導體製程導論作業解答CH9
  • 修課須知_v5
Co-Instructor(s)
莊婉君
Co-Instructor(s)
陳威龍
Co-Instructor(s)
張壹筌

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